Concepedia

A. F. Otterloo

AF

Statistics

Publications

3

Citations

140

H-Index

3

Active since

1988

Affiliations

Philips (Netherlands)(Current)

A. F. Otterloo is an author at Philips (Netherlands) specializing in engineering, applied physics, and materials science.

Top concepts

Publications per year

1988–1992

3

Publications

3

Kinetical Aspects of the LPCVD of Titanium Nitride from Titanium Tetrachloride and Ammonia

M. J. Buiting, A. F. Otterloo, A.H. Montree · Journal of The Electrochemical Society · 1991 · 93 citations

, , +18

Relationship Between the Process Parameters and Film Properties of “Low Temperature” Low Pressure Chemical Vapor Deposition Titanium Nitride Films

M. J. Buiting, A. F. Otterloo · Journal of The Electrochemical Society · 1992 · 36 citations

, , +17

Surface segregation and preferential sputtering of bismuth in rf-magnetron-sputtered iron-garnet films

J.‐P. Krumme, A. F. Otterloo, P. C. Zalm et al. · Journal of Applied Physics · 1988 · 11 citations

, , +21

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