Chemical deposition of Al2O3 thin films on Si substrates

Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates

Markus D. Groner, Jeffrey W. Elam, F. Fabreguette et al. · Thin Solid Films · 2002 · 724 citations

Natural Sciences, Materials Engineering, Materials Science +17

Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100)

Tonya M. Klein, Dongfang Niu, William S. Epling et al. · Applied Physics Letters · 1999 · 203 citations

Natural Sciences, Chemistry, Materials Science +17

Physical and electrical properties of noncrystalline Al2O3 prepared by remote plasma enhanced chemical vapor deposition

R. S. Johnson, G. Lucovsky, Isreal Baumvol · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 182 citations

Natural Sciences, Materials Engineering, Materials Science +17

Aluminum oxide thin films prepared by chemical vapor deposition from aluminum 2-ethylhexanoate

Toshiro Maruyama, T. NAKAI · Applied Physics Letters · 1991 · 128 citations · Full text

Natural Sciences, Chemistry, Materials Science +17

Properties of aluminum oxide thin films deposited by pulsed laser deposition and plasma enhanced chemical vapor deposition

C. Cibert, H. Hidalgo, C. Champeaux et al. · Thin Solid Films · 2007 · 98 citations

Natural Sciences, Materials Engineering, Materials Science +16