Exploring Ni–Si thin-film reactions by means of simultaneous synchrotron X-Ray diffraction and substrate curvature measurements

Constitution of Binary Alloys

Max Hansen, K. Anderko, H. W. Salzberg · Journal of The Electrochemical Society · 1958 · 14.8K citations

Natural Sciences, Chemistry, Materials Science +8

The tension of metallic films deposited by electrolysis

G. Stoney · Proceedings of the Royal Society of London Series A Containing Papers of a Mathematical and Physical Character · 1909 · 4.8K citations · Full text

Natural Sciences, Chemistry, Materials Science +11

Towards implementation of a nickel silicide process for CMOS technologies

C. Lavoie, F. M. d’Heurle, Christophe Detavernier et al. · Microelectronic Engineering · 2003 · 406 citations

Engineering, Electrical Engineering, Materials Engineering +12

Silicide-induced stress in Si: origin and consequences for MOS technologies

An Steegen, Karen Maex · Materials Science and Engineering R Reports · 2002 · 82 citations

Engineering, Materials Engineering, Materials Science +14

Thermal expansion of the isostructural PtSi and NiSi: Negative expansion coefficient in NiSi and stress effects in thin films

Christophe Detavernier, C. Lavoie, F. M. d’Heurle · Journal of Applied Physics · 2003 · 67 citations

Natural Sciences, Materials Engineering, Materials Science +17