Scaling of MOS technology to submicrometer feature sizes

Fowler-Nordheim Tunneling into Thermally Grown SiO2

M. Lenzlinger, E. H. Snow · Journal of Applied Physics · 1969 · 1.7K citations

Natural Sciences, Materials Science, Physics +14

VLSI limitations from drain-induced barrier lowering

R.R. Troutman · IEEE Transactions on Electron Devices · 1979 · 395 citations

Engineering, Computer Engineering, Electrical Engineering +17

Fundamental limitations in microelectronics—I. MOS technology

B. Hoeneisen, Carver Mead · Solid-State Electronics · 1972 · 364 citations

Engineering, Electrical Engineering, Microelectronics +13

Trading speed for low power by choice of supply and threshold voltages

D. Liu, C. Svensson · IEEE Journal of Solid-State Circuits · 1993 · 276 citations

Engineering, Computer Engineering, Electrical Engineering +17

Future CMOS scaling and reliability

C. Hu · Proceedings of the IEEE · 1993 · 208 citations

Engineering, Computer Engineering, Electrical Engineering +17