Concepedia

Highly anisotropic silicon and polysilicon room-temperature etching using fluorine-based high density plasmas

Angeliki Tserepi, Christophe Cardinaud, L. Rolland, G. Turban

Microelectronic Engineering · 1998 · 18 citations · 3 references

DOI

Concepts

References

3

Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle density

J. W. Coburn, Min Chen · Journal of Applied Physics · 1980 · 873 citations

, , +14

Highly anisotropic silicon reactive ion etching for nanofabrication using mixtures of SF6/CHF3 gases

S. Grigoropoulos, Angeliki Tserepi, A. G. Nassiopoulos · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 36 citations

, , +19

Highly anisotropic room-temperature sub-half-micron Si reactive ion etching using fluorine only containing gases

S. Grigoropoulos, A. G. Nassiopoulos · Microelectronic Engineering · 1995 · 31 citations · Full text

, , +9