Interfacial Layer-Induced Mobility Degradation in High-<i>k</i>Transistors

Abstract

Analysis of electrical and scanning transmission electron microscopy (STEM) and electron energy loss spectra (EELS) data suggests that Hf-based high-k dielectrics deposited on a SiO2 layer modifies the oxygen content of the latter resulting in reduction of the oxide energy band gap and correspondingly increasing its k value. High-k deposition on thinner SiO2 films, below 1.1 nm, may lead to the formation of a highly oxygen deficient amorphous interfacial layer adjacent to the Si substrate. This layer was identified as an important factor contributing to mobility degradation in high-k transistors.