Howard R. Huff

Gate stack technology for nanoscale devices

Byoung Hun Lee, Jungwoo Oh, Hsin Tseng et al. · Materials Today · 2006 · 168 citations · Full text

Engineering, Electrical Engineering, Materials Science +17

Dielectrics for future transistors

G. Bersuker, P. Zeitzoff, George Brown et al. · Materials Today · 2004 · 93 citations · Full text

Engineering, Computer Engineering, Electrical Engineering +17

Interfacial Layer-Induced Mobility Degradation in High-<i>k</i>Transistors

G. Bersuker, Joel Barnett, N. Moumen et al. · Japanese Journal of Applied Physics · 2004 · 75 citations

Engineering, Materials Engineering, Materials Science +17

High-k gate stacks for planar, scaled CMOS integrated circuits

Howard R. Huff, C. Lim, Y. Kim et al. · Microelectronic Engineering · 2003 · 63 citations

Engineering, Computer Engineering, Electrical Engineering +12

Experimental observations of the thermal stability of high-k gate dielectric materials on silicon

Patrick Lysaght, P.J. Chen, Renate Bergmann et al. · Journal of Non-Crystalline Solids · 2002 · 62 citations

Natural Sciences, Materials Engineering, Materials Science +16