Howard R. Huff

Gate stack technology for nanoscale devices

Byoung Hun Lee, Jungwoo Oh, Hsin Tseng et al. · Materials Today · 2006 · 168 citations · Full text

Electrical Engineering, Engineering, Planar Cmos Devices +13

Dielectrics for future transistors

G. Bersuker, P. Zeitzoff, George Brown et al. · Materials Today · 2004 · 93 citations · Full text

Future Transistors, Electrical Engineering, Physical Design (Electronics) +15

Interfacial Layer-Induced Mobility Degradation in High-<i>k</i>Transistors

G. Bersuker, Joel Barnett, N. Moumen et al. · Japanese Journal of Applied Physics · 2004 · 74 citations

Materials Science, Semiconductor Technology, Electrical Engineering +13

High-k gate stacks for planar, scaled CMOS integrated circuits

Howard R. Huff, C. Lim, Y. Kim et al. · Microelectronic Engineering · 2003 · 63 citations

Electrical Engineering, Physical Design (Electronics), Engineering +6

Experimental observations of the thermal stability of high-k gate dielectric materials on silicon

Patrick Lysaght, P.J. Chen, Renate Bergmann et al. · Journal of Non-Crystalline Solids · 2002 · 62 citations

Electrical Engineering, Semiconductor Device, Engineering +9