Renate Bergmann

Experimental observations of the thermal stability of high-k gate dielectric materials on silicon

Patrick Lysaght, P.J. Chen, Renate Bergmann et al. · Journal of Non-Crystalline Solids · 2002 · 62 citations

Electrical Engineering, Semiconductor Device, Engineering +9

Conventional n-channel MOSFET devices using single layer HfO/sub 2/ and ZrO/sub 2/ as high-k gate dielectrics with polysilicon gate electrode

Yudong Kim, G. Gebara, M. B. Freiler et al. · 2002 · 61 citations

Zro/sub 2//Poly-si Transistors, Electrical Engineering, Zro/sub 2/ +13

Review of SrBi₂Ta₂O₉ thin films capacitor processing

C. Dehm, Walter Hartner, G. Schindler et al. · Integrated ferroelectrics · 1999 · 15 citations

Engineering, Emerging Memory Technology, Thin Film Process Technology +16

Integration of high-k gate stack systems into planar CMOS process flows

Howard R. Huff, Avinash Kumar Ágarwal, Y. Kim et al. · 2002 · 14 citations

Engineering, Vlsi Design, Computer Architecture +19

Challenges in Integrating the High-K Gate Dielectric Film to the Conventional Cmos Process Flow

Avinash Kumar Ágarwal, M. B. Freiler, P. Lysaght et al. · MRS Proceedings · 2001 · 11 citations

Electrical Engineering, Engineering, Advanced Packaging (Semiconductors) +7