Challenges in Integrating the High-K Gate Dielectric Film to the Conventional Cmos Process Flow - Concepedia

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Challenges in Integrating the High-K Gate Dielectric Film to the Conventional Cmos Process Flow

11

Citations

5

References

2001

Year

Avinash Kumar Ágarwal, M. B. Freiler, P. Lysaght, L. G. Perrymore, Renate Bergmann, Chris Sparks, Bill Bowers, Joel Barnett, Deborah J. Riley, Yudong Kim,

MRS Proceedings

Electrical EngineeringEngineeringAdvanced Packaging (Semiconductors)NanoelectronicsApplied PhysicsTime-dependent Dielectric BreakdownSemiconductor Device FabricationElectronic PackagingMicroelectronicsInterconnect (Integrated Circuits)

References

	Year	Citations

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