Optical emission study of CH4+CHF3 ECR plasma and properties of a-C:F:H films

Optical Properties and Electronic Structure of Amorphous Germanium

J. Tauc, R. Grigorovici, A. Vancu · physica status solidi (b) · 1966 · 10.4K citations

Materials Science, Optical Materials, Engineering +15

Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle density

J. W. Coburn, Min Chen · Journal of Applied Physics · 1980 · 873 citations

Noble Gas, Engineering, Reactive Plasmas +14

Spectroscopic diagnostics of CF4-O2 plasmas during Si and SiO2 etching processes

Riccardo d’Agostino, F. Cramarossa, S. De Benedictis et al. · Journal of Applied Physics · 1981 · 302 citations

Engineering, Plasma Combustion, Chemistry +21

Time-modulated electron cyclotron resonance plasma discharge for controlling generation of reactive species

Seiji Samukawa, Shuichi Furuoya · Applied Physics Letters · 1993 · 115 citations

Optical Materials, Engineering, Glow Discharge +18

Carbon dimer, C2, as a growth species for diamond films from methane/hydrogen/argon microwave plasmas

D. M. Gruen, Chris D. Zuiker, A.R. Krauss et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1995 · 100 citations

Engineering, Chemistry, Plasma Processing +21