Chemical amplification of resist lines (CARL)

Mask bias in submicron optical lithography

Chris A. Mack, Patricia M. Kaufman · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1988 · 17 citations

Illumination Modeling, Photonics, Image Formation +14

Silicon containing photoresists for half micron lithography

Recai Sezi, Michael Sebald, R. Leuschner · Polymer Engineering and Science · 1989 · 15 citations

Engineering, Electron-beam Lithography, Optoelectronic Devices +17

Lithographic, Photochemical And O 2 RIE Properties Of Three Polysilane Copolymers

Gary N. Taylor, M. Y. Hellman, Thomas Wolf et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1988 · 15 citations

Backbone Si-si Bonds, High Si Content, Engineering +21