Michael Sebald

<title>Application aspects of the Si-CARL bilayer process</title>

Michael Sebald, Joerg Berthold, M. Beyer et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1991 · 16 citations

Electrical Engineering, Engineering, Microfabrication +12

Benefits and prospects of aqueous silylation for novel dry developable high-resolution resists

Recai Sezi, Michael Sebald, R. Leuschner et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1990 · 16 citations

Engineering, Base Resin, Chemistry +16

Silicon containing photoresists for half micron lithography

Recai Sezi, Michael Sebald, R. Leuschner · Polymer Engineering and Science · 1989 · 15 citations

Engineering, Electron-beam Lithography, Optoelectronic Devices +17

Chemical amplification of resist lines: a novel sub-half-micron bilayer resist tehnique for NUV and deep-UV lithography

Michael Sebald, R. Leuschner, Recai Sezi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1990 · 14 citations

Engineering, Electron-beam Lithography, Deep-uv Lithography +22

Chemical amplification of resist lines (CARL)

Michael Sebald, Recai Sezi, R. Leuschner et al. · Microelectronic Engineering · 1990 · 12 citations

Chemical Amplification, Chemical Engineering, Engineering +5