Syntheses and optical properties of low-temperature SiOx and TiOx thin films prepared by plasma enhanced CVD

Optical properties of thin films

D. E. Aspnes · Thin Solid Films · 1982 · 1.6K citations

Natural Sciences, Materials Science, Physics +14

Infrared spectroscopic study of SiO<i>x</i> films produced by plasma enhanced chemical vapor deposition

P. G. Pai, S. S. Chao, Yasuo Takagi et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 799 citations

Natural Sciences, Chemistry, Materials Science +17

Local-field effects and effective-medium theory: A microscopic perspective

D. E. Aspnes · American Journal of Physics · 1982 · 763 citations

Natural Sciences, Physics, Condensed Matter Physics +13

Investigation of SiO2 plasma enhanced chemical vapor deposition through tetraethoxysilane using attenuated total reflection Fourier transform infrared spectroscopy

Shashank C. Deshmukh, Eray S. Aydil · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1995 · 131 citations

Natural Sciences, Materials Engineering, Materials Science +17

Silicon oxide deposition from tetraethoxysilane in a radio frequency downstream reactor: Mechanisms and step coverage

Nur Selamoglu, J. A. Mucha, D. E. Ibbotson et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1989 · 112 citations

Natural Sciences, Chemistry, Materials Science +13