Concepedia

A study of deposition of ITO films on organic layer using facing target sputtering in Ar and Kr gases

Hao Lei, Keisuke Ichikawa, Y. Hoshi, Meihan Wang, Takayuki Uchida, Yutaka Sawada

Thin Solid Films · 2009 · 17 citations · 7 references

DOI

Concepts

References

7

Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering

T. Sasabayashi, Norihiro Ito, E. Nishimura et al. · Thin Solid Films · 2003 · 156 citations

, , +17

Energetic particle bombardment of films during magnetron sputtering

S. M. Rossnagel · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 80 citations

, , +12

Structure and electrical properties of ITO thin films deposited at high rate by facing target sputtering

Y. Hoshi, H. Kato, Kentaro Funatsu · Thin Solid Films · 2003 · 68 citations

, , +16

Gas pressure effects on thickness uniformity and circumvented deposition during sputter deposition process

Takeo Nakano, Shigeru Baba · Vacuum · 2005 · 30 citations

, , +15

Transparent conductive film for top-emission organic light-emitting devices by low damage facing target sputtering

Yusuke Onai, Takayuki Uchida, Yoshihiro Kasahara et al. · Thin Solid Films · 2007 · 21 citations

, , +17