Structure and electrical properties of ITO thin films deposited at high rate by facing target sputtering - Concepedia

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Structure and electrical properties of ITO thin films deposited at high rate by facing target sputtering

68

Citations

13

References

2003

Year

Y. Hoshi, H. Kato, Kentaro Funatsu

Thin Solid Films

Materials ScienceElectrical EngineeringTarget SputteringEngineeringHigh RateSurface ScienceApplied PhysicsIto Thin FilmsThin FilmsMicroelectronicsOptoelectronicsChemical Vapor DepositionThin Film Processing

References

	Year	Citations

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