Nanopatterning with interferometric lithography using a compact /spl lambda/=46.9-nm laser

Abstract

We report the imprinting of nanometer-scale gratings by interferometric lithography at /spl lambda/=46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd's mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications.