Fabrication of N+/P ultra-shallow junctions by plasma doping for 65 nm CMOS technology - Concepedia

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Fabrication of N+/P ultra-shallow junctions by plasma doping for 65 nm CMOS technology

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References

2004

Year

F. Lallement, A. Grouillet, M. Juhel, J.-P. Reynard, D. Lenoble, Ziwei Fang, S.R. Walther, Y Rault, Ludovic Godet, J.T. Scheuer

Surface and Coatings Technology

Electrical EngineeringEngineeringPhysicsNanoelectronicsApplied PhysicsSemiconductor MaterialSemiconductor Device FabricationNm Cmos TechnologyMicroelectronicsN+/p Ultra-shallow JunctionsSemiconductor Device

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