Low temperature doping of arsenic atoms in silicon during Pd2Si formation

Solid Solubilities of Impurity Elements in Germanium and Silicon*

F. A. Trumbore · Bell System Technical Journal · 1960 · 1.4K citations

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The redistribution of implanted dopants after metal-silicide formation

M. Wittmer, Thomas E. Seidel · Journal of Applied Physics · 1978 · 115 citations

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Low-temperature redistribution of As in Si during Pd2Si formation

Iwao Ohdomari, K. N. Tu, K. Suguro et al. · Applied Physics Letters · 1981 · 54 citations

Engineering, Materials Engineering, Materials Science +16