Dependence of TO and LO mode frequency of thermally grown silicon dioxide films on annealing temperature - Concepedia

Concepedia

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Dependence of TO and LO mode frequency of thermally grown silicon dioxide films on annealing temperature

14

Citations

8

References

1997

Year

Kenji Ishikawa, Y. Uchiyama, Hiroki Ogawa, Shigeto Fujimura

Applied Surface Science

Materials ScienceIi-vi SemiconductorEngineeringPhysicsNanoelectronicsApplied PhysicsCondensed Matter PhysicsSemiconductor MaterialLo Mode FrequencySilicon On InsulatorMicroelectronicsThin Film Processing

References

	Year	Citations

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