Thermal Annealing
Thermal Annealing is a post-deposition thin film processing technique in which controlled heating is applied to an amorphous semiconductor to induce structural relaxation, defect passivation, and enhanced electrical properties through atomic rearrangement without melting the material.
7.8K
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350.4K
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31.8K
Authors
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2017–2026
1.8K
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High Performance Silicon Nanowire Field Effect Transistors
Yi Cui, Zhaohui Zhong, Deli Wang et al. · Nano Letters · 2003 · 2.1K citations
Nested sampling for general Bayesian computation
John Skilling · Bayesian Analysis · 2006 · 1.7K citations · Full text
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Stanford Synchrotron Radiation Lightsource, United States
19 publications · 2.4K citations
18
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18
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Centro de Investigación y de Estudios Avanzados del Instituto Politécnico Nacional, Mexico
20 publications · 887 citations
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3.6K

Chinese Academy of Sciences
Beijing, China
61 h-index
1.3K publications
64.3K citations

Centre National de la Recherche Scientifique
Paris, France
48 h-index
927 publications
33.2K citations
Massachusetts Institute of Technology
Cambridge, United States
39 h-index
242 publications
16.8K citations

Lawrence Berkeley National Laboratory
Berkeley, United States
38 h-index
258 publications
17.8K citations
North Carolina State University
Raleigh, United States
38 h-index
300 publications
16.3K citations
Beijing National Laboratory for Molecular Sciences
Beijing, China
37 h-index
247 publications
20.2K citations
Seoul National University
Seoul, South Korea
36 h-index
291 publications
15K citations
Institute of Chemistry
Beijing, China
35 h-index
239 publications
19.3K citations
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910 publications · 44.9K citations
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831 publications · 32.2K citations
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191 publications · 9.7K citations
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60 publications · 9K citations
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76 publications · 12.9K citations
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