Thermal Annealing

Thermal Annealing is a post-deposition thin film processing technique in which controlled heating is applied to an amorphous semiconductor to induce structural relaxation, defect passivation, and enhanced electrical properties through atomic rearrangement without melting the material.

7.8K

Publications

350.4K

Citations

31.8K

Authors

3.6K

Institutions

Publications per year

2017–2026

1.8K

Authors

31.8K

  1. SJ
    S. J. Pearton

    University of Florida, United States

    40 publications · 1.9K citations

    24

    h-index

  2. YL
    Yongfang Li

    Chinese Academy of Sciences, China

    22 publications · 2.3K citations

    21

    h-index

  3. MF
    Michael F. Toney

    Stanford Synchrotron Radiation Lightsource, United States

    19 publications · 2.4K citations

    18

    h-index

  4. CJ
    C. Jagadish

    Australian National University, Australia

    24 publications · 700 citations

    18

    h-index

  5. OZ
    O. Zelaya-Ángel

    Centro de Investigación y de Estudios Avanzados del Instituto Politécnico Nacional, Mexico

    20 publications · 887 citations

    16

    h-index

1–5 of 31.8K

Venues

  1. Applied Physics Letters

    910 publications · 44.9K citations

    93

    h-index

  2. Journal of Applied Physics

    831 publications · 32.2K citations

    80

    h-index

  3. ACS Applied Materials & Interfaces

    191 publications · 9.7K citations

    55

    h-index

  4. Advanced Materials

    60 publications · 9K citations

    45

    h-index

  5. Advanced Functional Materials

    76 publications · 12.9K citations

    45

    h-index

1–5