Concepedia

J. Angilello

JA

20

Publications

1.1K

Citations

17

H-Index

1969

Active since

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

IBM (United States)

J. Angilello is an author at IBM Research - Thomas J. Watson Research Center specializing in applied physics, engineering, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceMaterials EngineeringThin FilmsCrystalline DefectsSurface SciencePhysicsMicrostructureCondensed Matter Physics

Publications per year

1969–1992

20

Publications

20

A Viscous Flow Model to Explain the Appearance of High Density Thermal SiO2 at Low Oxidation Temperatures

E. A. Irene, E. Tierney, J. Angilello · Journal of The Electrochemical Society · 1982 · 226 citations

Engineering, Oxidation Resistance, Low Oxidation Temperatures +21

Modification of niobium film stress by low-energy ion bombardment during deposition

J. J. Cuomo, J. M. E. Harper, C. R. Guarnieri et al. · Journal of Vacuum Science and Technology · 1982 · 160 citations

Niobium Film Stress, Engineering, Vacuum Device +17

Lattice Compression from Conduction Electrons in Heavily Doped Si:As

G. S. Cargill, J. Angilello, K. L. Kavanagh · Physical Review Letters · 1988 · 119 citations

Materials Science, Semiconductors, Engineering +10

Disorder in Al-Li-Cu and Al-Mn-Si Icosahedral Alloys

Paul A. Heiney, Peter A. Bancel, Paul Horn et al. · Science · 1987 · 80 citations

Materials Science, Materials Engineering, Icosahedral Al +15

Lanthanide gallate perovskite-type substrates for epitaxial, high-T <sub>c</sub> superconducting Ba <sub>2</sub> YCu <sub>3</sub> O <sub>7-δ</sub> films

E. A. Giess, R. L. Sandstrom, W. J. Gallagher et al. · IBM Journal of Research and Development · 1990 · 67 citations

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