Japanese Journal of Applied Physics · 2008 · 31 citations · 3 references
EngineeringElectrical EngineeringManufacturing EngineeringMicroelectronicsOptoelectronicsPhotonicsMask DesignMask FabricationExtreme Ultraviolet LithographyExtreme Ultraviolet Mask DesignOptical LithographyTool Design
The small-field exposure tool (SFET) for extreme ultraviolet (EUV) lithography was manufactured by Canon and EUVA and installed in Selete. It is being used for developing mask, resist, and tool technologies. In this paper, we review the current status of SFET development and present some initial results on lithographic performance and tool stability.
3
Path to the HVM in EUVL through the development and evaluation of the SFET
Shigeyuki Uzawa, Hiroyoshi Kubo, Yoshinori Miwa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 40 citations
Engineering, Electrical Engineering, Manufacturing Engineering +11