Concepedia
Statistics
Publications
4
Citations
67
H-Index
Active since
2008
Seiichiro Shirai is an author specializing in extreme ultraviolet lithography, optical lithography, and photonics.
Publications per year
2008–2009
Extreme Ultraviolet Lithography Using Small-Field Exposure Tool: Current Status
Kazuo Tawarayama, Shunko Magoshi, Yuusuke Tanaka et al. · Japanese Journal of Applied Physics · 2008 · 31 citations
Engineering, Electrical Engineering, Manufacturing Engineering +9
Recent progress of EUV full-field exposure tool in Selete
Kazuo Tawarayama, Hajime Aoyama, Shunko Magoshi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 13 citations
Engineering, Electrical Engineering, Instrumentation +12
Effects of aberration and flare on lithographic performance of SFET
Yuusuke Tanaka, Hajime Aoyama, Kazuo Tawarayama et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 13 citations
Medicine, Biomedical Engineering, Biomedical Optics +11
Lithographic Performance of Extreme Ultravolet Full-Field Exposure Tool at Selete
Kazuo Tawarayama, Hajime Aoyama, Takashi Kamo et al. · Japanese Journal of Applied Physics · 2009 · 10 citations
Natural Sciences, Physics, Optics +12
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