Journal of Applied Physics · 1991 · 18 citations · 24 references
Natural SciencesMaterials SciencePhysicsElectronic MaterialsMaterials PhysicsSemiconductor MaterialsDevice SimulationDopingElectron TransportElectronic Transport ModelingMonte Carlo Transport MethodsSemiconductor PhysicsCarrier Transport ModelingImpurity ScatteringMonte Carlo Electron TransportPhase Shift AnalysisPhenomenological ModelsSilicon Device SimulationSilicon Electrical PropertiesTransport Cross Sections
An improved Monte Carlo model for ionized-impurity scattering is developed and used to calculate majority- and minority-electron mobilities in silicon. The model includes scattering cross sections derived from phase-shift analysis, implementation of the Friedel sum rule, and a simple phenomenological model for multiple-potential scattering. This model provides a very good fit to experiment using a single adjustable parameter. Electron mobilities in n- and p-type Si are calculated and fit to experimental data at 300 and 77 K. Experimental results for Si of μn(NA)/μn(ND) ≊ 2 at 300 K are reproduced and a value of 3 < μn(NA)/μn(ND) < 4 is predicted at 77 K.
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Theory of Impurity Scattering in Semiconductors
E. M. Conwell, V. F. Weisskopf · Physical Review · 1950 · 931 citations
Electron drift velocity in silicon
C. Canali, Carlo Jacoboni, F. Nava et al. · Physical review. B, Solid state · 1975 · 502 citations