Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 42 citations · 5 references
EngineeringElectrical EngineeringMaterials ScienceMicrofabricationPattern FormationSemiconductor DevicesPattern GenerationSelf-assembled MaterialsSelf-assembled NanostructuresBlock Copolymer Self-assemblyDevice FabricationDigital Logic CircuitsDirected Self-assemblyOptical LithographyPolymer Self-assemblySelf-assembling Polymers
Block copolymer directed self-assembly (DSA) is a promising extension of optical lithography for device fabrication akin to double-patterning. The irregular distribution of contact holes in circuit layouts is one of the biggest challenges for DSA patterning because the self-assembly tends to form regular patterns naturally. Although the small guiding templates are shown to guide the self-assembly off the natural geometry by strong boundary confinement [1, 2] (Fig. 1), it is insufficient to simply surround contact holes with guiding templates without optimizing the placement and geometry of the guiding templates.
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APF pitch-halving for 22nm logic cells using gridded design rules
Michael C. Smayling, Christopher Bencher, Hao D. Chen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 30 citations
Engineering, Computer Engineering, Electrical Engineering +13