Experimental demonstration of aperiodic patterns of directed self-assembly by block copolymer lithography for random logic circuit layout

Abstract

We have experimentally demonstrated block copolymer lithography in conjunction with optical lithography features on dimensional scales close to the natural pitch of the self-assembling block copolymer. Within this context, the inherent self-assembled shape, size and arrangement will self-adjust to accommodate the external confinement. This added flexibility of directed self-assembly of aperiodic patterns can potentially be used for patterning contact holes for random logic circuit layout.