Demonstration of plutonium etching in a RF glow discharge

Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle density

J. W. Coburn, Min Chen · Journal of Applied Physics · 1980 · 880 citations

Natural Sciences, Physics, Optics +16

Plasma etching—A discussion of mechanisms

J. W. Coburn, Harold F. Winters · Journal of Vacuum Science and Technology · 1979 · 601 citations

Natural Sciences, Chemistry, Materials Science +15

Some Chemical Aspects of the Fluorocarbon Plasma Etching of Silicon and Its Compounds

E. Kay · IBM Journal of Research and Development · 1979 · 120 citations

Engineering, Materials Engineering, Materials Science +14

Some chemical aspects of the fluorocarbon plasma etching of silicon and its compounds

Microelectronics Reliability · 1979 · 106 citations

Engineering, Materials Engineering, Materials Science +14

Dependence of F atom density on pressure and flow rate in CF4 glow discharges as determined by emission spectroscopy

J. W. Coburn, M. Chen · Journal of Vacuum Science and Technology · 1981 · 76 citations

Natural Sciences, Chemistry, Physics +16