Work Function Engineering

Work Function Engineering is the systematic modification of the electronic work function of a material surface or interface through controlled physical, chemical, or structural alterations to achieve desired charge carrier alignment and contact behavior in metal-semiconductor systems.

327

Publications

19.2K

Citations

1.8K

Authors

447

Institutions

Publications per year

2017–2026

122

Authors

1.8K

  1. DS
    Dheeraj Sharma

    Indian Institute of Information Technology Design and Manufacturing Jabalpur, India

    9 publications · 856 citations

    9

    h-index

  2. AV
    A. Veloso

    IMEC, Belgium

    7 publications · 164 citations

    7

    h-index

  3. TS
    T. Schram

    IMEC, Belgium

    7 publications · 147 citations

    7

    h-index

  4. PR
    P. Ranade

    University of California, Berkeley, United States

    6 publications · 516 citations

    6

    h-index

  5. HW
    H.C. Wen

    Texas Instruments (United States), United States

    6 publications · 365 citations

    6

    h-index

1–5 of 1.8K

Venues

  1. Applied Surface Science

    17 publications · 617 citations

    16

    h-index

  2. IEEE Electron Device Letters

    19 publications · 1.1K citations

    16

    h-index

  3. Applied Physics Letters

    20 publications · 1.1K citations

    16

    h-index

  4. IEEE Transactions on Electron Devices

    17 publications · 2K citations

    14

    h-index

  5. ACS Applied Materials & Interfaces

    9 publications · 345 citations

    9

    h-index

1–5