Concepedia

Wafer Cleaning

Wafer Cleaning is a methodological process within semiconductor manufacturing that systematically removes contaminants, particles, and impurities from the surface of a silicon wafer to ensure optimal substrate integrity and performance in subsequent cleanroom processing steps.

400

Publications

14.9K

Citations

1.6K

Authors

385

Institutions

Publications per year

2017–2026

46

Variants

Wafer Surface Cleaning

Parents

Publications

400

The Evolution of Silicon Wafer Cleaning Technology

Werner Kern · Journal of The Electrochemical Society · 1990 · 1.7K citations

, , +17

Silicon Cleaning with Hydrogen Peroxide Solutions: A High Energy Electron Diffraction and Auger Electron Spectroscopy Study

Richard C. Henderson · Journal of The Electrochemical Society · 1972 · 234 citations

, , +17

Crystal-Originated Singularities on Si Wafer Surface after SC1 Cleaning

Jiro Ryuta, E. Morita, Toshiro Tanaka et al. · Japanese Journal of Applied Physics · 1990 · 229 citations

, , +12

Efficient pulsed laser removal of 0.2 μm sized particles from a solid surface

Werner Zapka, W. Ziemlich, A. C. Tam · Applied Physics Letters · 1991 · 229 citations

, , +17

Total Room Temperature Wet Cleaning for Si Substrate Surface

Tadahiro Ohmi · Journal of The Electrochemical Society · 1996 · 190 citations

, , +14

1–5 of 400

Authors

1.6K

  1. PM
    Paul Mertens

    IMEC, Belgium

    11 publications · 385 citations

    10

    h-index

  2. AB
    Ahmed Busnaina

    Northeastern University, United States

    9 publications · 466 citations

    9

    h-index

  3. TO
    T. Ohmi

    Tohoku University, Japan

    7 publications · 408 citations

    7

    h-index

  4. MH
    Marc Heyns

    IMEC, Belgium

    6 publications · 275 citations

    6

    h-index

  5. RV
    Rita Vos

    IMEC, Belgium

    6 publications · 180 citations

    6

    h-index

1–5 of 1.6K

Institutions

385

  1. IMEC

    Leuven, Belgium

    15 h-index

    111 publications

    4.6K citations

  2. University of Arizona

    Tucson, United States

    12 h-index

    47 publications

    1.1K citations

  3. Tohoku University

    Sendai, Japan

    12 h-index

    44 publications

    2K citations

  4. Centre National de la Recherche Scientifique

    Paris, France

    12 h-index

    36 publications

    744 citations

  5. IBM (United States)

    Armonk, United States

    10 h-index

    43 publications

    1.2K citations

  6. Hitachi (Japan)

    Tokyo, Japan

    9 h-index

    24 publications

    739 citations

  7. Hanyang University

    Seoul, South Korea

    8 h-index

    25 publications

    1.3K citations

  8. Intel (United States)

    Santa Clara, United States

    8 h-index

    27 publications

    824 citations

1–8 of 385

Venues

  1. Journal of The Electrochemical Society

    JES · 53 publications · 3.7K citations

    27

    h-index

  2. Japanese Journal of Applied Physics

    JJAP · 23 publications · 1.1K citations

    16

    h-index

  3. IEEE Transactions on Semiconductor Manufacturing

    18 publications · 648 citations

    14

    h-index

  4. Journal of Applied Physics

    17 publications · 434 citations

    14

    h-index

  5. Microelectronic Engineering

    16 publications · 349 citations

    13

    h-index

1–5