Label-Free and Real-Time Detection of Tuberculosis in Human Urine Samples Using a Nanophotonic Point-of-Care Platform

Patricia Ramirez‐Priego, Daan Martens, Ayssar A. Elamin, +9

ACS Sensors

Photonic SensorPoint-of-care TestingEngineeringMycobacterium Cell WallBiomedical Engineering +20

Fundamental study of the removal mechanisms of nano-sized particles using brush scrubber cleaning

Kai Xu, Rita Vos, Guy Vereecke, +7

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringBrush Scrubber CleaningChemical EngineeringWafer Scale ProcessingNanoscale Chemistry +20

A low-cost integrated biosensing platform based on SiN nanophotonics for biomarker detection in urine

Dries S. Martens, Patricia Ramirez‐Priego, Mohammed Sharif Murib, +16

Analytical Methods

Photonic SensorPoint-of-care TestingEngineeringBiomedical EngineeringBiosensors +15

Particle adhesion and removal mechanisms during brush scrubber cleaning

Kai Xu, Rita Vos, Guy Vereecke, +6

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Materials ScienceBrush ScrubbersChemical EngineeringSelf-cleaning SurfaceEngineering +10

Evaluation of Megasonic Cleaning for Sub-90nm Technologies

Guy Vereecke, Frank Holsteyns, Sophia Arnauts, +8

Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

Materials ScienceChemical EngineeringEngineeringNanoscale ChemistryFragile Structures +13

Cost-effective cleaning and high-quality thin gate oxides

Marc Heyns, Twan Bearda, Ingrid Cornelissen, +15

IBM Journal of Research and Development

Materials EngineeringElectrical EngineeringChemical EngineeringEngineeringWafer Scale Processing +12

Removal of Submicrometer Particles from Silicon Wafer Surfaces Using HF-Based Cleaning Mixtures

Rita Vos, Marcel Lux, Kai Xu, +7

Journal of The Electrochemical Society

Materials ScienceSubmicrometer ParticlesChemical EngineeringWafer Scale ProcessingEngineering +10

A Novel Resist and Post-Etch Residue Removal Process Using Ozonated Chemistry

Stefan De Gendt, Preston T. Snee, Ingrid Cornelissen, +6

Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

Advanced Oxidation ProcessChemical EngineeringEnvironmental ChemistryEngineeringEnvironmental Engineering +8

Chemical Vapor Deposition of Azidoalkylsilane Monolayer Films

Rita Vos, Cédric Rolin, Jens Rip, +6

Langmuir

Flexible and robust capping-metal gate integration technology enabling multiple-VT CMOS in MuGFETs

A. Veloso, Liesbeth Witters, M. Demand, +18

Low-power ElectronicsMaterials ScienceElectrical EngineeringMaterials EngineeringEngineering +8