Substrate Etching
Substrate Etching is a chemical or physical process in microfabrication whereby material is selectively removed from a substrate surface to create predefined patterns or modify surface morphology, distinguishing it from other substrate preparation techniques by its precision and integration with lithographic processes.
154
Publications
6.2K
Citations
649
Authors
208
Institutions
Publications per year
2017–2026
12
154
M. Schaepkens, T. E. F. M. Standaert, N. R. Rueger et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 312 citations · Full text
1–5 of 154
649
IBM Research - Thomas J. Watson Research Center, United States
3 publications · 197 citations
3
h-index
3
h-index
3
h-index
IBM Research - Thomas J. Watson Research Center, United States
3 publications · 197 citations
3
h-index
3
h-index
1–5 of 649
208
Hitachi (Japan)
Tokyo, Japan
6 h-index
18 publications
619 citations

Chinese Academy of Sciences
Beijing, China
4 h-index
19 publications
1.9K citations
Seoul National University
Seoul, South Korea
4 h-index
16 publications
371 citations
The University of Osaka
Osaka, Japan
4 h-index
17 publications
331 citations
NEC (Japan)
Tokyo, Japan
4 h-index
9 publications
286 citations
NTT Basic Research Laboratories
Atsugi, Japan
3 h-index
9 publications
619 citations
Lam Research (United States)
Fremont, United States
3 h-index
4 publications
453 citations
IBM Research - Thomas J. Watson Research Center
Yorktown Heights, United States
3 h-index
11 publications
803 citations
1–8 of 208
17 publications · 1.1K citations
15
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JES · 17 publications · 492 citations
12
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JJAP · 11 publications · 284 citations
11
h-index
10 publications · 319 citations
10
h-index
7 publications · 169 citations
7
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1–5