Substrate Etching

Substrate Etching is a chemical or physical process in microfabrication whereby material is selectively removed from a substrate surface to create predefined patterns or modify surface morphology, distinguishing it from other substrate preparation techniques by its precision and integration with lithographic processes.

154

Publications

6.2K

Citations

649

Authors

208

Institutions

Publications per year

2017–2026

12

Authors

649

  1. JM
    J. M. E. Harper

    IBM Research - Thomas J. Watson Research Center, United States

    3 publications · 197 citations

    3

    h-index

  2. MT
    M. Taneya

    The University of Osaka, Japan

    3 publications · 54 citations

    3

    h-index

  3. TS
    Tomohiro Shimizu

    Kansai University, Japan

    3 publications · 351 citations

    3

    h-index

  4. JJ
    J. J. Cuomo

    IBM Research - Thomas J. Watson Research Center, United States

    3 publications · 197 citations

    3

    h-index

  5. SH
    Sang Heup Moon

    Seoul National University, South Korea

    3 publications · 59 citations

    3

    h-index

1–5 of 649

Venues

  1. Applied Physics Letters

    17 publications · 1.1K citations

    15

    h-index

  2. Journal of The Electrochemical Society

    JES · 17 publications · 492 citations

    12

    h-index

  3. Japanese Journal of Applied Physics

    JJAP · 11 publications · 284 citations

    11

    h-index

  4. 10

    h-index

  5. Journal of Applied Physics

    7 publications · 169 citations

    7

    h-index

1–5