Concepedia

Residual Layer Control

Residual Layer Control is a process-level technique in nanoimprint lithography that governs the thickness and uniformity of the thin polymer layer remaining between imprinted features after patterning, distinguishing itself by enabling precise management of pattern fidelity, feature resolution, and etch bias in nanoscale fabrication.

49

Publications

1.6K

Citations

198

Authors

82

Institutions

Publications per year

2017–2026

4

Parents

Publications

49

Raman scattering study of the properties and removal of excess Te on CdTe surfaces

P. M. Amirtharaj, Fred H. Pollak · Applied Physics Letters · 1984 · 238 citations

, , +17

On the relation between ozone storage in the residual layer and daily variation in near-surface ozone concentration ? A case study

Urs Neu, Thomas K�nzle, Heinz Wanner · Boundary-Layer Meteorology · 1994 · 125 citations

, , +17

On the Scale-dependence of the Gradient Richardson Number in the Residual Layer

B. B. Balsley, Gunilla Svensson, Michael Tjernström · Boundary-Layer Meteorology · 2007 · 85 citations

, , +11

Evidence Of Dynamical Coupling Between The Residual Layer And The Developing Convective Boundary Layer

Gilberto J. Fochesatto, Cyrille Flamant, D. Guédalia et al. · Boundary-Layer Meteorology · 2001 · 73 citations

, , +16

Novel Process for Titanium Dioxide Production from Titanium Slag: NaOH-KOH Binary Molten Salt Roasting and Water Leaching

Dong Wang, Jinglong Chu, Yahui Liu et al. · Industrial & Engineering Chemistry Research · 2013 · 72 citations · Full text

, , +12

1–5 of 49

Authors

198

  1. HH
    Hiroshi Hiroshima

    National Institute of Advanced Industrial Science and Technology, Japan

    4 publications · 85 citations

    4

    h-index

  2. ET
    Ecron Thompson

    The University of Texas at Austin, United States

    3 publications · 99 citations

    3

    h-index

  3. HS
    Hella‐Christin Scheer

    University of Wuppertal, Germany

    3 publications · 94 citations

    3

    h-index

  4. MW
    M. Wissen

    University of Wuppertal, Germany

    3 publications · 94 citations

    3

    h-index

  5. HS
    Helmut Schift

    Paul Scherrer Institute, Switzerland

    2 publications · 31 citations

    2

    h-index

1–5 of 198

Institutions

82

  1. Japan Science and Technology Agency

    Tokyo, Japan

    4 h-index

    8 publications

    182 citations

  2. National Institute of Advanced Industrial Science and Technology

    Tsukuba, Japan

    4 h-index

    7 publications

    143 citations

  3. Lawrence Berkeley National Laboratory

    Berkeley, United States

    3 h-index

    8 publications

    212 citations

  4. Centre National de la Recherche Scientifique

    Paris, France

    3 h-index

    12 publications

    285 citations

  5. University of Wuppertal

    Wuppertal, Germany

    3 h-index

    11 publications

    358 citations

  6. Chinese Academy of Sciences

    Beijing, China

    3 h-index

    25 publications

    952 citations

  7. Paul Scherrer Institute

    Villigen, Switzerland

    2 h-index

    2 publications

    31 citations

  8. Toshiba (Japan)

    Tokyo, Japan

    2 h-index

    14 publications

    216 citations

1–8 of 82

Venues

  1. Microelectronic Engineering

    9 publications · 186 citations

    9

    h-index

  2. 5

    h-index

  3. 5

    h-index

  4. Boundary-Layer Meteorology

    4 publications · 303 citations

    4

    h-index

  5. Nanotechnology

    3 publications · 87 citations

    3

    h-index

1–5