Ecron Thompson

Step and Repeat UV nanoimprint lithography tools and processes

Ian McMackin, Jin Choi, Philip Schumaker et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 55 citations

Materials Science, Molecular Imprints, Engineering +14

Direct imprinting of dielectric materials for dual damascene processing

M. D. Stewart, Jeffery T. Wetzel, Gerard M. Schmid et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 32 citations

Dual Damascene Approach, Engineering, Electron-beam Lithography +16

Development of imprint materials for the Step and Flash Imprint Lithography process

Frank Xu, Nicholas A. Stacey, M. Watts et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 30 citations

32 nm imprint masks using variable shape beam pattern generators

Kosta Selinidis, Ecron Thompson, Gerard M. Schmid et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 25 citations

Ionization-induced nonequivalent absorption in a birefringent silica fiber

Edward W. Taylor, V. R. Wilson, M. L. Vigil et al. · IEEE Photonics Technology Letters · 1989 · 20 citations

Birefringent Fiber, Photonics, Optical Materials +13