Polysilicon Surface Micromachining
Polysilicon Surface Micromachining is a surface micromachining technique in which structural layers composed of polycrystalline silicon are selectively deposited and patterned on a substrate to fabricate microelectromechanical systems (MEMS) devices, distinguished from other surface micromachining methods by the use of polysilicon as the primary mechanical material.
200
Publications
10.9K
Citations
598
Authors
142
Institutions
Publications per year
2017–2026
2
Parents
200
1–5 of 200
598
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142
University of California, Berkeley
Berkeley, United States
24 h-index
64 publications
3.6K citations
Sandia National Laboratories
Albuquerque, United States
14 h-index
38 publications
2K citations
University of Michigan
Ann Arbor, United States
14 h-index
41 publications
4.2K citations
Sandia National Laboratories California
Livermore, United States
12 h-index
43 publications
2K citations
Case Western Reserve University
Cleveland, United States
11 h-index
37 publications
1.3K citations
University of Wisconsin–Madison
Madison, United States
6 h-index
19 publications
1.2K citations

Uppsala University
Uppsala, Sweden
6 h-index
18 publications
1.3K citations
Samsung (South Korea)
Seoul, South Korea
6 h-index
16 publications
359 citations
1–8 of 142
24 publications · 1.6K citations
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17 publications · 627 citations
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17 publications · 938 citations
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JMM · 17 publications · 1.2K citations
13
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Conference · 8 publications · 275 citations
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1–5