Polysilicon Surface Micromachining

Polysilicon Surface Micromachining is a surface micromachining technique in which structural layers composed of polycrystalline silicon are selectively deposited and patterned on a substrate to fabricate microelectromechanical systems (MEMS) devices, distinguished from other surface micromachining methods by the use of polysilicon as the primary mechanical material.

200

Publications

10.9K

Citations

598

Authors

142

Institutions

Publications per year

2017–2026

2

Authors

598

  1. RT
    Roger T. Howe

    University of California, Berkeley, United States

    15 publications · 1.2K citations

    15

    h-index

  2. MM
    Mehran Mehregany

    Case Western Reserve University, United States

    13 publications · 645 citations

    12

    h-index

  3. JS
    J.J. Sniegowski

    Sandia National Laboratories, United States

    9 publications · 742 citations

    9

    h-index

  4. CT
    Clark T.‐C. Nguyen

    University of Michigan, United States

    9 publications · 1.2K citations

    9

    h-index

  5. RM
    R.S. Muller

    University of California, Berkeley, United States

    5 publications · 192 citations

    5

    h-index

1–5 of 598

Venues

  1. Journal of Microelectromechanical Systems

    24 publications · 1.6K citations

    19

    h-index

  2. 15

    h-index

  3. Sensors and Actuators A Physical

    17 publications · 938 citations

    15

    h-index

  4. Journal of Micromechanics and Microengineering

    JMM · 17 publications · 1.2K citations

    13

    h-index

  5. 7

    h-index

1–5