Oxide Breakdown

Oxide Breakdown is a thin film oxidation phenomenon characterized by the catastrophic failure of a metal oxide layer due to excessive electric field stress or prolonged environmental exposure, resulting in loss of protective functionality and increased oxidation kinetics.

682

Publications

31.2K

Citations

1.9K

Authors

509

Institutions

Publications per year

2017–2026

47

Authors

1.9K

  1. EY
    Ernest Y. Wu

    IBM (United States), United States

    28 publications · 1.5K citations

    23

    h-index

  2. JS
    J. Suñé

    Universitat Autònoma de Barcelona, Spain

    32 publications · 1.6K citations

    21

    h-index

  3. GG
    G. Groeseneken

    IMEC, Belgium

    33 publications · 2.2K citations

    21

    h-index

  4. RD
    R. Degraeve

    IMEC, Belgium

    26 publications · 2.1K citations

    20

    h-index

  5. CH
    Chenming Hu

    University of California, Berkeley, United States

    18 publications · 1.8K citations

    18

    h-index

1–5 of 1.9K

Venues

  1. IEEE Transactions on Electron Devices

    66 publications · 4.9K citations

    37

    h-index

  2. IEEE Electron Device Letters

    50 publications · 2.6K citations

    27

    h-index

  3. Journal of Applied Physics

    39 publications · 2.6K citations

    25

    h-index

  4. Journal of The Electrochemical Society

    JES · 32 publications · 1.6K citations

    24

    h-index

  5. Applied Physics Letters

    41 publications · 1.6K citations

    23

    h-index

1–5