Nucleation Delay

Nucleation Delay is a phenomenon in thin-film growth processes, specifically within atomic layer deposition, characterized by the initial period during which adsorption of precursor molecules occurs without the formation of a continuous film, due to insufficient surface reactivity or coverage required for sustained layer-by-layer deposition.

72

Publications

2.9K

Citations

273

Authors

135

Institutions

Publications per year

2017–2026

21

Variants

Incubation Time

Authors

273

  1. WM
    W. M. M. Kessels

    Eindhoven University of Technology, Netherlands

    4 publications · 293 citations

    4

    h-index

  2. AJ
    Adriaan J. M. Mackus

    Eindhoven University of Technology, Netherlands

    3 publications · 356 citations

    3

    h-index

  3. MC
    M. C. M. van de Sanden

    Eindhoven University of Technology, Netherlands

    3 publications · 147 citations

    3

    h-index

  4. SF
    Stacey F. Bent

    Stanford University, United States

    3 publications · 184 citations

    3

    h-index

  5. JO
    J. Osaka

    NTT Basic Research Laboratories, Japan

    2 publications · 35 citations

    2

    h-index

1–5 of 273

Venues

  1. Chemistry of Materials

    8 publications · 475 citations

    8

    h-index

  2. Applied Physics Letters

    4 publications · 93 citations

    4

    h-index

  3. Journal of The Electrochemical Society

    JES · 3 publications · 108 citations

    3

    h-index

  4. Applied Surface Science

    3 publications · 93 citations

    3

    h-index

  5. The Journal of Chemical Physics

    3 publications · 136 citations

    3

    h-index

1–5