Nonideal Capacitance Effects
Nonideal Capacitance Effects is a theoretical construct in semiconductor device physics that characterizes deviations from ideal MOS capacitor behavior due to physical phenomena such as interface traps, oxide charges, and mobility degradation, which alter the capacitance-voltage relationship.
32
Publications
1.2K
Citations
104
Authors
49
Institutions
Publications per year
2017–2026
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Fraunhofer Institute for Reliability and Microintegration, Germany
1 publications · 35 citations
1
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1–5 of 104
49
Technische Universität Dresden
Dresden, Germany
2 h-index
3 publications
192 citations
NaMLab (Germany)
Dresden, Germany
2 h-index
7 publications
530 citations

Centre National de la Recherche Scientifique
Paris, France
2 h-index
5 publications
99 citations
Stanford University
Stanford, United States
2 h-index
3 publications
46 citations

Pennsylvania State University
State College, United States
1 h-index
2 publications
328 citations

Odesa I. I. Mechnikov National University
Odesa, Ukraine
1 h-index
2 publications
22 citations

Cairo University
Giza, Egypt
1 h-index
1 publications
16 citations
STMicroelectronics (France)
Montrouge, France
1 h-index
2 publications
60 citations
1–8 of 49
3 publications · 203 citations
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3 publications · 114 citations
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1 publications · 11 citations
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JES · 1 publications · 27 citations
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1 publications · 14 citations
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