Multi-layer Lithography

Multi-Layer Lithography is a thin film lithography technique that involves the sequential patterning and deposition of multiple functional layers on a substrate to create complex, vertically integrated micro- or nanoscale structures, distinguished from single-layer approaches by its ability to achieve three-dimensional device architectures through precise interlayer alignment and registration.

20

Publications

396

Citations

112

Authors

37

Institutions

Publications per year

2017–2026

1

Variants

Multilayer Lithography

Authors

112

  1. JG
    J.P. Gouy

    Laboratory for Integrated Micro-Mechatronic Systems, Japan

    1 publications · 31 citations

    1

    h-index

  2. DJ
    Daniel J. O’Brien

    The University of Texas MD Anderson Cancer Center, United States

    1 publications · 29 citations

    1

    h-index

  3. JZ
    Jian Zhong

    Shanghai Ocean University, China

    1 publications · 25 citations

    1

    h-index

  4. TF
    Timon Fliervoet

    ASML (Netherlands), Netherlands

    1 publications · 11 citations

    1

    h-index

  5. MM
    Martijn Maassen

    ASML (Netherlands), Netherlands

    1 publications · 19 citations

    1

    h-index

1–5 of 112

Venues

  1. 5

    h-index

  2. RSC Advances

    1 publications · 14 citations

    1

    h-index

  3. Optical Review

    1 publications · 11 citations

    1

    h-index

  4. Nanoscale

    1 publications · 25 citations

    1

    h-index

  5. 1

    h-index

1–5