Multi-layer Lithography
Multi-Layer Lithography is a thin film lithography technique that involves the sequential patterning and deposition of multiple functional layers on a substrate to create complex, vertically integrated micro- or nanoscale structures, distinguished from single-layer approaches by its ability to achieve three-dimensional device architectures through precise interlayer alignment and registration.
20
Publications
396
Citations
112
Authors
37
Institutions
Publications per year
2017–2026
1
Variants
Multilayer Lithography
Parents
20
Embedded-mask-methods for mm-scale multi-layer vertical/slanted Si structures
Yoshio Mita, M. Mita, A. Tixier et al. · 2002 · 31 citations
Engineering, Electrical Engineering, Manufacturing Engineering +13
1–5 of 20
112
1
h-index
The University of Texas MD Anderson Cancer Center, United States
1 publications · 29 citations
1
h-index
1
h-index
1
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1
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1–5 of 112
37

Centre National de la Recherche Scientifique
Paris, France
2 h-index
4 publications
86 citations
ASML (Netherlands)
Veldhoven, The Netherlands
2 h-index
18 publications
326 citations

University of Twente
Enschede, The Netherlands
1 h-index
1 publications
58 citations

Saarland University
Saarbrücken, Germany
1 h-index
2 publications
28 citations
Jinan Military General Hospital
Jinan, China
1 h-index
1 publications
25 citations
Motorola (United States)
Schaumburg, United States
1 h-index
3 publications
36 citations
Carnegie Mellon University
Pittsburgh, United States
1 h-index
2 publications
24 citations

Shanghai Jiao Tong University
Shanghai, China
1 h-index
1 publications
25 citations
1–8 of 37
5 publications · 67 citations
5
h-index
1 publications · 14 citations
1
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1 publications · 11 citations
1
h-index
1 publications · 25 citations
1
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1 publications · 23 citations
1
h-index
1–5