Concepedia

Mask Registration

Mask Registration is a methodological framework in mask fabrication that specifies the precise alignment of successive photomasks relative to a substrate and each other, ensuring accurate pattern transfer across multiple lithographic layers in semiconductor manufacturing.

33

Publications

927

Citations

116

Authors

34

Institutions

Publications per year

2017–2026

2

Parents

Publications

33

Repositioning accuracy of two different mask systems—3D revisited: Comparison using true 3D/3D matching with cone-beam CT

Judit Boda‐Heggemann, Cornelia Walter, A. Rahn et al. · International Journal of Radiation Oncology*Biology*Physics · 2006 · 100 citations · Full text

, , +11

A new interferometric alignment technique

D. C. Flanders, Henry I. Smith, Stewart Austin · Applied Physics Letters · 1977 · 75 citations

, , +15

Toward Large‐Scale Alignment of Electrohydrodynamic Patterning of Thin Polymer Films

Ning Wu, Leonard F. Pease, William B. Russel · Advanced Functional Materials · 2006 · 74 citations

, , +16

A low-dispersion survey spectrograph (LDSS-2) for the William Herschel Telescope

J. R. Allington‐Smith, M. Breare, Richard S. Ellis et al. · Publications of the Astronomical Society of the Pacific · 1994 · 70 citations · Full text

, , +13

Navigation accuracy after automatic- and hybrid-surface registration in sinus and skull base surgery

Tanja Daniela Grauvogel, Paul Engelskirchen, Wiebke Semper-Hogg et al. · PLoS ONE · 2017 · 41 citations · Full text

, , +17

1–5 of 33

Authors

116

  1. DC
    D. C. Flanders

    Massachusetts Institute of Technology, United States

    3 publications · 124 citations

    3

    h-index

  2. NR
    Norbert Rosenkranz

    Carl Zeiss (Germany), Germany

    2 publications · 21 citations

    2

    h-index

  3. GK
    Gerd Klose

    University of Arizona, United States

    2 publications · 21 citations

    2

    h-index

  4. BB
    Benjamin B. Yellen

    Duke University, United States

    2 publications · 54 citations

    2

    h-index

  5. GF
    Gary Friedman

    Drexel University, United States

    2 publications · 54 citations

    2

    h-index

1–5 of 116

Institutions

34

  1. Massachusetts Institute of Technology

    Cambridge, United States

    3 h-index

    10 publications

    391 citations

  2. Intel (United States)

    Santa Clara, United States

    3 h-index

    10 publications

    244 citations

  3. Carl Zeiss (Germany)

    Oberkochen, Germany

    3 h-index

    13 publications

    150 citations

  4. MIT Lincoln Laboratory

    Lexington, United States

    3 h-index

    9 publications

    316 citations

  5. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    2 h-index

    6 publications

    104 citations

  6. Heidelberg University

    Heidelberg, Germany

    2 h-index

    7 publications

    334 citations

  7. Drexel University

    Philadelphia, United States

    2 h-index

    6 publications

    162 citations

  8. Mitsubishi Electric (United States)

    Cypress, United States

    1 h-index

    1 publications

    13 citations

1–8 of 34

Venues

  1. 6

    h-index

  2. Journal of Vacuum Science and Technology

    5 publications · 110 citations

    5

    h-index

  3. Advanced Functional Materials

    2 publications · 95 citations

    2

    h-index

  4. IEEE Transactions on Electron Devices

    2 publications · 32 citations

    2

    h-index

  5. PLoS ONE

    1 publications · 41 citations

    1

    h-index

1–5