Concepedia

Mask Data Preparation

Mask Data Preparation is a computational process in semiconductor manufacturing that transforms circuit design data into a precise, manufacturable format for photomask fabrication, distinguishing itself by incorporating resolution enhancement techniques, proximity correction, and data fracturing to ensure accurate pattern transfer onto silicon wafers.

22

Publications

455

Citations

84

Authors

31

Institutions

Publications per year

2017–2026

2

Parents

Publications

22

Low k 1 logic design using gridded design rules

Michael C. Smayling, Huayu Liu, Lynn Cai · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 55 citations

, , +12

Quality Improvements of ‘AW3D’ Global Dsm Derived from Alos Prism

Junichi Takaku, Takeo Tadono, K. Tsutsui et al. · 2018 · 40 citations

, , +17

Systematic mask synthesis for surface micromachined microelectromechanical systems

Venkataraman Ananthakrishnan, Radha Sarma, G. K. Ananthasuresh · Journal of Micromechanics and Microengineering · 2003 · 28 citations · Full text

, , +13

"Membuilder": An Automated 3D Solid Model Construction Program For Microelectromechanical Structures

P.M. Osterberg, S.D. Senturia · Proceedings of the International Solid-State Sensors and Actuators Conference - TRANSDUCERS '95 · 2005 · 27 citations

, , +13

Resolution enhancement optimization methods in optical lithography with improved manufacturability

Xu Ma · Journal of Micro/Nanolithography MEMS and MOEMS · 2011 · 26 citations

, , +12

1–5 of 22

Authors

84

  1. IB
    Ingo Bork

    Siemens (United States), United States

    3 publications · 46 citations

    3

    h-index

  2. AF
    Aki Fujimura

    JEOL (Japan), Japan

    3 publications · 49 citations

    3

    h-index

  3. SI
    Soichi Inoue

    Toshiba (Japan), Japan

    2 publications · 33 citations

    2

    h-index

  4. SK
    Suigen Kyoh

    Toshiba (Japan), Japan

    2 publications · 33 citations

    2

    h-index

  5. TK
    Tadashi Komagata

    JEOL (Japan), Japan

    2 publications · 31 citations

    2

    h-index

1–5 of 84

Institutions

31

  1. University of California San Diego

    San Diego, United States

    2 h-index

    5 publications

    82 citations

  2. Tela Innovations (United States)

    Los Gatos, United States

    2 h-index

    2 publications

    67 citations

  3. Toshiba (Japan)

    Tokyo, Japan

    2 h-index

    9 publications

    151 citations

  4. JEOL (Japan)

    Tokyo, Japan

    2 h-index

    5 publications

    78 citations

  5. Siemens (Hungary)

    Budapest, Hungary

    1 h-index

    1 publications

    12 citations

  6. GlobalFoundries (United States)

    Santa Clara, United States

    1 h-index

    2 publications

    36 citations

  7. Vilnius Gediminas Technical University

    Vilnius, Lithuania

    1 h-index

    2 publications

    48 citations

  8. Infineon Technologies (Germany)

    Munich, Germany

    1 h-index

    2 publications

    24 citations

1–8 of 31

Venues

  1. 11

    h-index

  2. 1

    h-index

  3. 1

    h-index

  4. Elektronika ir Elektrotechnika

    1 publications · 24 citations

    1

    h-index

  5. Journal of Micromechanics and Microengineering

    JMM · 1 publications · 28 citations

    1

    h-index

1–5