Concepedia

Mask Cleaning

Mask Cleaning is a semiconductor fabrication process that belongs to the class of photomask maintenance techniques, distinguished by its specific purpose of removing particulate, organic, and inorganic contaminants from photomasks without altering their optical or physical properties, thereby ensuring pattern fidelity and extending mask lifetime in lithography systems.

55

Publications

1.9K

Citations

283

Authors

104

Institutions

Publications per year

2017–2026

18

Parents

Publications

55

Valorization of disposable COVID-19 mask through the thermo-chemical process

Sungyup Jung, Sang Yoon Lee, Xiaomin Dou et al. · Chemical Engineering Journal · 2020 · 269 citations · Full text

, , +10

Reusability Comparison of Melt-Blown vs Nanofiber Face Mask Filters for Use in the Coronavirus Pandemic

Sana Ullah, Azeem Ullah, Jaeyun Lee et al. · ACS Applied Nano Materials · 2020 · 244 citations · Full text

, , +12

Preventing masks from becoming the next plastic problem

Elvis Genbo Xu, Zhiyong Jason Ren · Frontiers of Environmental Science & Engineering · 2021 · 129 citations · Full text

, , +9

Mask crisis during the COVID-19 outbreak.

Guangjun Ji, L. Ye, J. Chen · PubMed · 2020 · 115 citations · Full text

, , +17

Knowledge, attitude, practice and perception regarding COVID-19 among students in Bangladesh: Survey in Rajshahi University

Abdul Wadood, ASMA Mamun, Md. Abdur Rafi et al. · medRxiv · 2020 · 91 citations · Full text

, , +13

1–5 of 55

Authors

283

  1. TL
    Ted Liang

    Intel (United States), United States

    4 publications · 73 citations

    4

    h-index

  2. TW
    Takeo Watanabe

    University of Hyogo, Japan

    4 publications · 64 citations

    4

    h-index

  3. HK
    Hiroo Kinoshita

    University of Hyogo, Japan

    4 publications · 64 citations

    4

    h-index

  4. PY
    Pei-yang Yan

    Intel (United States), United States

    4 publications · 93 citations

    4

    h-index

  5. GZ
    Guojing Zhang

    Intel (United States), United States

    3 publications · 57 citations

    3

    h-index

1–5 of 283

Institutions

104

  1. Intel (United States)

    Santa Clara, United States

    8 h-index

    24 publications

    429 citations

  2. IMEC

    Leuven, Belgium

    4 h-index

    18 publications

    257 citations

  3. Hoya (Japan)

    Tokyo, Japan

    3 h-index

    10 publications

    194 citations

  4. University of Hyogo

    Kobe, Japan

    2 h-index

    6 publications

    132 citations

  5. Ghent University

    Ghent, Belgium

    2 h-index

    11 publications

    170 citations

  6. Physikalisch-Technische Bundesanstalt

    Braunschweig, Germany

    2 h-index

    5 publications

    71 citations

  7. Himeji University

    Himeji, Japan

    2 h-index

    9 publications

    116 citations

  8. Purchase College

    Purchase, United States

    1 h-index

    1 publications

    16 citations

1–8 of 104

Venues

  1. 13

    h-index

  2. Microelectronic Engineering

    3 publications · 62 citations

    3

    h-index

  3. 2

    h-index

  4. 2

    h-index

  5. Applied Physics A

    2 publications · 55 citations

    2

    h-index

1–5