Junction Breakdown

Junction Breakdown is a semiconductor phenomenon in which a p-n junction experiences a sudden increase in reverse current due to impact ionization or quantum tunneling when the applied reverse bias voltage exceeds a critical threshold.

854

Publications

33.7K

Citations

2.7K

Authors

613

Institutions

Publications per year

2017–2026

172

Variants

P-n Junction Breakdown

Authors

2.7K

  1. SJ
    S. J. Pearton

    University of Florida, United States

    19 publications · 1K citations

    16

    h-index

  2. FR
    F. Ren

    University of Florida, United States

    18 publications · 1K citations

    15

    h-index

  3. JS
    Jun Suda

    Kyoto University, Japan

    11 publications · 576 citations

    13

    h-index

  4. BJ
    B. Jayant Baliga

    North Carolina State University, United States

    14 publications · 900 citations

    12

    h-index

  5. BZ
    Bo Zhang

    University of Electronic Science and Technology of China, China

    11 publications · 202 citations

    11

    h-index

1–5 of 2.7K

Venues

  1. IEEE Transactions on Electron Devices

    123 publications · 5.3K citations

    39

    h-index

  2. IEEE Electron Device Letters

    82 publications · 4.5K citations

    36

    h-index

  3. Applied Physics Letters

    78 publications · 3.7K citations

    33

    h-index

  4. Journal of Applied Physics

    52 publications · 2.9K citations

    27

    h-index

  5. Solid-State Electronics

    59 publications · 2.6K citations

    23

    h-index

1–5