Concepedia

Film Conformality

Film Conformality is a material deposition characteristic in chemical vapor deposition that denotes the uniformity of film thickness and coverage over complex, non-planar substrate topographies, distinguishing it from isotropic or directional deposition behaviors by its ability to replicate underlying surface features with minimal variation in thickness.

141

Publications

8.5K

Citations

580

Authors

165

Institutions

Publications per year

2017–2026

35

Parents

Publications

141

Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing

H. Kim · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 541 citations

, , +17

Conformality in atomic layer deposition: Current status overview of analysis and modelling

Véronique Cremers, Riikka L. Puurunen, Jolien Dendooven · Applied Physics Reviews · 2019 · 500 citations · Full text

, , +17

A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches

Roy G. Gordon, Dennis M. Hausmann, E. Kim et al. · Chemical Vapor Deposition · 2003 · 390 citations · Full text

, , +17

Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition

Jeong-Gyu Song, Jusang Park, Wonseon Lee et al. · ACS Nano · 2013 · 374 citations

, , +17

Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition

Mikko Ritala, Markku Leskelä, Jan-Pieter Dekker et al. · Chemical Vapor Deposition · 1999 · 298 citations

, , +14

1–5 of 141

Authors

580

  1. MR
    Mikko Ritala

    University of Helsinki, Finland

    8 publications · 1.1K citations

    9

    h-index

  2. RL
    Riikka L. Puurunen

    VTT Technical Research Centre of Finland, Finland

    7 publications · 731 citations

    8

    h-index

  3. WM
    W. M. M. Kessels

    Eindhoven University of Technology, Netherlands

    8 publications · 710 citations

    8

    h-index

  4. ML
    Markku Leskelä

    University of Helsinki, Finland

    8 publications · 1.1K citations

    8

    h-index

  5. HC
    Harm C. M. Knoops

    Eindhoven University of Technology, Netherlands

    5 publications · 221 citations

    5

    h-index

1–5 of 580

Institutions

165

  1. University of Helsinki

    Helsinki, Finland

    10 h-index

    34 publications

    3.5K citations

  2. Eindhoven University of Technology

    Eindhoven, The Netherlands

    7 h-index

    30 publications

    2.5K citations

  3. Aalto University

    Espoo, Finland

    6 h-index

    7 publications

    1.7K citations

  4. University of Illinois Urbana-Champaign

    Urbana, United States

    6 h-index

    20 publications

    640 citations

  5. VTT Technical Research Centre of Finland

    Espoo, Finland

    6 h-index

    11 publications

    1.9K citations

  6. Ghent University

    Ghent, Belgium

    5 h-index

    24 publications

    3.4K citations

  7. Arizona State University

    Tempe, United States

    5 h-index

    18 publications

    408 citations

  8. Oxford Instruments (United Kingdom)

    Abingdon, United Kingdom

    5 h-index

    5 publications

    427 citations

1–8 of 165

Venues

  1. Journal of The Electrochemical Society

    JES · 16 publications · 1.1K citations

    16

    h-index

  2. 14

    h-index

  3. Chemistry of Materials

    9 publications · 583 citations

    9

    h-index

  4. Journal of Applied Physics

    6 publications · 286 citations

    6

    h-index

  5. Japanese Journal of Applied Physics

    JJAP · 6 publications · 114 citations

    6

    h-index

1–5