Concepedia

Edge Placement Error

Edge Placement Error is a metric in mask design that quantifies the deviation between the intended position of a feature edge on a photomask and its actual fabricated position, serving to assess the precision of pattern transfer in semiconductor lithography.

70

Publications

1.8K

Citations

243

Authors

57

Institutions

Publications per year

2017–2026

22

Variants

Epe

Parents

Publications

70

International Roadmap for Devices and Systems lithography roadmap

Mark Neisser · Journal of Micro/Nanopatterning Materials and Metrology · 2021 · 78 citations · Full text

, , +15

Overlay and edge placement control strategies for the 7nm node using EUV and ArF lithography

Jan Mulkens, M. M. Hanna, Hannah Wei et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 68 citations

, , +17

Advanced Optical Proximity Correction (OPC) Techniques in Computational Lithography: Addressing the Challenges of Pattern Fidelity and Edge Placement Error

Preethish Nanan Botlagunta, Subrahmanyasarma Chitta · Global Journal of Medical Case Reports · 2022 · 64 citations · Full text

, , +15

Process variation aware OPC with variational lithography modeling

Peng Yu, Sean X. Shi, David Z. Pan · 2006 · 60 citations

, , +15

Fast Lithographic Mask Optimization Considering Process Variation

Yu-Hsuan Su, Yu-Chen Huang, Liang-Chun Tsai et al. · IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems · 2016 · 57 citations

, , +15

1–5 of 70

Authors

243

  1. DZ
    David Z. Pan

    The University of Texas at Austin, United States

    8 publications · 266 citations

    8

    h-index

  2. AB
    Andrew B. Kahng

    University of California San Diego, United States

    5 publications · 82 citations

    5

    h-index

  3. BY
    Bei Yu

    Chinese University of Hong Kong, Hong Kong SAR China

    4 publications · 131 citations

    4

    h-index

  4. MD
    Martin D. F. Wong

    University of Illinois Urbana-Champaign, United States

    4 publications · 69 citations

    4

    h-index

  5. PG
    Puneet Gupta

    University of California, Los Angeles, United States

    4 publications · 72 citations

    4

    h-index

1–5 of 243

Institutions

57

  1. The University of Texas at Austin

    Austin, United States

    11 h-index

    27 publications

    818 citations

  2. ASML (Netherlands)

    Veldhoven, The Netherlands

    9 h-index

    44 publications

    1.5K citations

  3. Mentor Technologies

    Tulsa, United States

    6 h-index

    12 publications

    292 citations

  4. University of California San Diego

    San Diego, United States

    5 h-index

    12 publications

    208 citations

  5. University of Illinois Urbana-Champaign

    Urbana, United States

    4 h-index

    10 publications

    176 citations

  6. IMEC

    Leuven, Belgium

    4 h-index

    14 publications

    176 citations

  7. Hitachi (Japan)

    Tokyo, Japan

    4 h-index

    10 publications

    206 citations

  8. BlazeTech (United States)

    Woburn, United States

    4 h-index

    7 publications

    115 citations

1–8 of 57

Venues

  1. 13

    h-index

  2. 5

    h-index

  3. 5

    h-index

  4. International Conference on Computer Aided Design

    Conference · 2 publications · 33 citations

    2

    h-index

  5. Chinese Optics Letters

    1 publications · 18 citations

    1

    h-index

1–5