Mark Neisser

Metrology for the next generation of semiconductor devices

Ndubuisi G. Orji, Mustafa Badaroglu, Brian M. Barnes et al. · Nature Electronics · 2018 · 483 citations · Full text

Engineering, Electrical Engineering, Materials Science +14

ITRS lithography roadmap: 2015 challenges

Mark Neisser, Stefan Wurm · Advanced Optical Technologies · 2015 · 117 citations

Engineering, Manufacturing Engineering, Materials Science +12

International Roadmap for Devices and Systems lithography roadmap

Mark Neisser · Journal of Micro/Nanopatterning Materials and Metrology · 2021 · 78 citations · Full text

Engineering, Computer Engineering, Electrical Engineering +15

EUV resists based on tin-oxo clusters

Brian Cardineau, Ryan Del Re, Hashim Al-Mashat et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 60 citations

Natural Sciences, Chemistry, Materials Science +17

Platinum and palladium oxalates: positive-tone extreme ultraviolet resists

Miriam Sortland, Jodi Hotalen, Ryan Del Re et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2015 · 60 citations · Full text

Natural Sciences, Chemistry, Materials Science +12