Capacitance-voltage Profiling
Capacitance-Voltage Profiling is a semiconductor characterization technique that distinguishes itself by measuring the dependence of capacitive response on applied DC bias voltage to determine spatial carrier concentration profiles and interfacial trap states in electronic devices.
265
Publications
12.6K
Citations
1.1K
Authors
299
Institutions
Publications per year
2017–2026
36
Variants
C-v Profiling
Parents
265
Heavily doped <i>p</i>-ZnSe:N grown by molecular beam epitaxy
Jun Qiu, J. M. DePuydt, Hai‐Ping Cheng et al. · Applied Physics Letters · 1991 · 294 citations
1–5 of 265
1.1K
15
h-index
10
h-index
10
h-index
Institute of Microelectronics Technology and High Purity Materials, Russia
8 publications · 377 citations
8
h-index
8
h-index
1–5 of 1.1K
299
AT&T (United States)
Bedminster, United States
13 h-index
43 publications
2.9K citations
University of Florida
Gainesville, United States
10 h-index
44 publications
2.4K citations
Institute of Microelectronics Technology and High Purity Materials
Chernogolovka, Russia
9 h-index
21 publications
1.8K citations

National University of Science and Technology
Moscow, Russia
7 h-index
48 publications
2.7K citations
University of California, Santa Barbara
Santa Barbara, United States
7 h-index
18 publications
756 citations
IMEC
Leuven, Belgium
6 h-index
20 publications
373 citations
Stanford University
Stanford, United States
6 h-index
19 publications
689 citations

Centre National de la Recherche Scientifique
Paris, France
5 h-index
16 publications
722 citations
1–8 of 299
65 publications · 3.4K citations
33
h-index
53 publications · 3.4K citations
28
h-index
10 publications · 780 citations
10
h-index
8 publications · 464 citations
8
h-index
JJAP · 7 publications · 233 citations
7
h-index
1–5