John Zimmerman

Progress on EUV pellicle development

Carmen Zoldesi, K. Bal, Brian Blum et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 83 citations

Biology, Materials Science, Euv Defectivity Management +11

EUV lithography with the Alpha Demo Tools: status and challenges

Noreen Harned, M. Goethals, Rogier Groeneveld et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 49 citations

Engineering, Electron-beam Lithography, Target Fabrication +16

EUV lithography at chipmakers has started: performance validation of ASML's NXE:3100

Christian Wagner, Jose Bacelar, Noreen Harned et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 33 citations

Engineering, Electron-beam Lithography, Electronic Design Automation +19

EUVL system: moving towards production

H. Meiling, Nico Buzing, K. D. Cummings et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 32 citations · Full text

Short Wavelength Optic, Engineering, Electron-beam Lithography +26

EUV High-NA scanner and mask optimization for sub 8 nm resolution

Jan van Schoot, Koen van Ingen Schenau, Gerardo Bottiglieri et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 20 citations

High Resolution, Engineering, Microscopy +22