Se Jong Rhee

The Electrical and Material Characterization of Hafnium Oxynitride Gate Dielectrics With TaN-Gate Electrode

Chang Seok Kang, H.-J. Cho, Rino Choi et al. · IEEE Transactions on Electron Devices · 2004 · 103 citations

Engineering, Silicon On Insulator, Nanoelectronics +16

Metal gate-HfO/sub 2/ MOS structures on GaAs substrate with and without Si interlayer

Hyoung-sub Kim, Manhong Zhang, Chang-Yong Kang et al. · IEEE Electron Device Letters · 2006 · 81 citations

Engineering, Mos Structures, Gaas Substrate +16

High-k dielectrics and MOSFET characteristics

J.C. Lee, H.J. Cho, Chang Seok Kang et al. · 2004 · 55 citations

Materials Engineering, Electrical Engineering, Dielectrics +13

Thermally stable CVD HfO/sub x/N/sub y/ advanced gate dielectrics with poly-Si gate electrode

Chang‐Hwan Choi, Se Jong Rhee, T.S. Jeon et al. · 2003 · 50 citations

Materials Science, Materials Engineering, Electrical Engineering +14

Charge trapping and detrapping characteristics in hafnium silicate gate stack under static and dynamic stress

Rino Choi, Se Jong Rhee, J.C. Lee et al. · IEEE Electron Device Letters · 2005 · 47 citations

Engineering, Silicon On Insulator, Semiconductor Device +16