Keith Jackson

<title>Fabrication of miniaturized electrostatic deflectors using LIGA</title>

Keith Jackson, Chantal G. Khan Malek, Lawrence P. Murray et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1995 · 50 citations

Miniaturization, Electrohydrodynamics, Engineering +16

Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography

David Attwood, Gary E. Sommargren, R. Beguiristain et al. · Applied Optics · 1993 · 43 citations

Coherent Power, Short Wavelength Optic, Optical Materials +18

<title>System integration and performance of the EUV engineering test stand</title>

Daniel A. Tichenor, Avijit K. Ray-Chaudhuri, William C. Replogle et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 40 citations

Engineering Test Stand, Engineering, Electron-beam Lithography +28

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

Patrick Naulleau, Kenneth A. Goldberg, Erik H. Anderson et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 38 citations

Short Wavelength Optic, Optical Materials, Engineering +23

Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic

Patrick Naulleau, Kenneth A. Goldberg, Erik Anderson et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 36 citations

Ultraviolet Light, Engineering, Electron-beam Lithography +18