Keith Jackson - Concepedia

Author

Keith Jackson

Lawrence Berkeley National Laboratory

Also Known As

Jackson, Keith, Jackson, Keith H., Keith H Jackson, Keith H. Jackson, Keith Jackson, Maxim R. Shcherbakov

Publications

499

Citations

H-Index

Concepts

All Affiliations

Lawrence Berkeley National Laboratory University of California, Berkeley Sandia National Laboratories California Lawrence Livermore National Laboratory Intel (United States)

About

Keith Jackson is an author at Lawrence Berkeley National Laboratory specializing in engineering, instrumentation, and optical properties.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	12	14	365
2	Applied Physics	10	10	241
3	Health Sciences	3	3	96
4	Natural Sciences	2	2	59
5	Medicine	1	1	36

Keith Jackson

Publications

365

Citations

H-Index

Page 1

	Year	Citations
<title>Fabrication of miniaturized electrostatic deflectors using LIGA</title> Keith Jackson, Chantal G. Khan Malek, Lawrence P. Murray, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE MiniaturizationElectrohydrodynamicsEngineeringElectron-beam LithographyMicroscopy	1995	50
Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography David Attwood, Gary E. Sommargren, R. Beguiristain, Applied Optics Coherent PowerShort Wavelength OpticOptical MaterialsEngineeringOptical Testing	1993	43
<title>System integration and performance of the EUV engineering test stand</title> Daniel A. Tichenor, Avijit K. Ray-Chaudhuri, William C. Replogle, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Engineering Test StandEngineeringElectron-beam LithographyMicroscopyOptic Design	2001	40
Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic Patrick Naulleau, Kenneth A. Goldberg, Erik H. Anderson, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Short Wavelength OpticOptical MaterialsEngineeringElectron-beam LithographyMicroscopy	2002	38
Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic Patrick Naulleau, Kenneth A. Goldberg, Erik Anderson, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Ultraviolet LightEngineeringElectron-beam LithographyMicroscopyOptical Testing	2004	36
At-wavelength alignment and testing of the 0.3 NA MET optic Kenneth A. Goldberg, Patrick Naulleau, Paul Denham, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Short Wavelength OpticOptical MaterialsEngineeringMicroscopyOptical Testing	2004	33
Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry Kenneth A. Goldberg, Edita Tejnil, Sang Hun Lee, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringEuv SchwarzschildOptical TestingInterferometry	1997	24
Masks for high aspect ratio x-ray lithography Chantal Khan Malek, Keith Jackson, William D. Bonivert, Journal of Micromechanics and Microengineering Optical MaterialsEngineeringElectron-beam LithographyIntegrated CircuitsDeep X-ray Lithography	1996	21
EUV interferometric testing and alignment of the 0.3-NA MET optic Kenneth A. Goldberg, Patrick Naulleau, Paul Denham, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Short Wavelength OpticEngineeringMicroscopyOptic DesignOptical Testing	2004	18
Full control of superconducting qubits with combined on-chip microwave and flux lines Riccardo Manenti, Eyob A. Sete, Angela Q. Chen, arXiv (Cornell University) Superconducting MaterialEngineeringXyz LinesQuantum ComputingFlux Lines	2021	16

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