P. Stout

Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching

S. Banna, Ankur Agarwal, K. Tokashiki et al. · IEEE Transactions on Plasma Science · 2009 · 103 citations

Natural Sciences, Electrical Engineering, Physics +17

Molecular-dynamics model of energetic fluorocarbon-ion bombardment on SiO2 I. Basic model and CF2+-ion etch characterization

A. V. Stengach, K. G. Gaynullin, Victoria Andino-Pavlovsky et al. · Journal of Applied Physics · 2005 · 31 citations

Natural Sciences, Materials Engineering, Materials Science +17

Do the intramolecular CC stretching vibrational modes in ET mediate electron-pairing in κ-(ET)2X superconductors?

A. M. Kini, J.D. Dudek, K. Douglas Carlson et al. · Physica C Superconductivity · 1993 · 25 citations

Natural Sciences, Chemistry, Physics +14

In search of an isotope effect on Tc in κ-(ET)2X superconductors with 34S isotopic substitution in the eight sulfur atoms of bis (ethylenedithio) tetrathiafulvalene (ET)

K. Douglas Carlson, A. M. Kini, John A. Schlueter et al. · Physica C Superconductivity · 1993 · 14 citations

Natural Sciences, Materials Science, Physics +11

Application and simulation of low temperature plasma processes in semiconductor manufacturing

Peter L. G. Ventzek, Shahid Rauf, P. Stout et al. · Applied Surface Science · 2002 · 14 citations

Engineering, Electrical Engineering, Manufacturing Engineering +14